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edi ultrapure water system
22 Items Found
18.25 MΩ·cm EDI Ultrapure Water System Semiconductor Chip Cleaning Chemical Free Continuous Operation
Industrial EDI ultrapure water system produces 18.25MΩ·cm resistivity water for semiconductor chip cleaning. Features chemical-free EDI technology, two-stage RO with 99% desalination, PLC automation, and customizable capacity up to 5000L/H. Compliant with SEMI standards, includes UV sterilization and 1-year warranty.
Custom Industrial RO EDI Ultrapure Water System High Purity Output Chemical Free Operation
Custom industrial RO+EDI ultrapure water treatment equipment combines double-stage RO filtration and EDI electrodeionization to produce high-purity deionized water (15-18.25MΩ*cm). Features chemical-free operation, PLC intelligent control, fully customizable capacity (250L/H-5000L/H), skid-mounted structure, and stable performance for industrial production.
Fully Automatic High Purity Ultrapure Water Equipment Low Operating Cost Industrial Water Treatment System
Ultrapure water equipment produces high-purity water via multi-stage pretreatment, reverse osmosis, EDI, and polishing mixed bed. Features fully automatic operation, stable performance, low operating cost, and easy maintenance. Ideal for electronics, pharmaceuticals, laboratories, and industrial manufacturing.
Electroplating Anti Corrosion Ultrapure Water Equipment Double Stage RO EDI Deionization Custom Capacity 0.5-50m3/h
Full anti-corrosion industrial ultrapure water equipment for electroplating workshops. Features double stage RO + EDI deionization, removes chloride/heavy metal ions, 0.5-50m³/h capacity. Anti-rust design adapts to corrosive environments, 24H automatic operation with PLC control for stable low conductivity water output.
Pharmaceutical Sterile Ultrapure Water Equipment UV Sterilizing Device Low TOC Control GMP Compliance
Pharmaceutical sterile ultrapure water equipment with UV sterilizing device. Features 316L sterile tank, RO+EDI purification, UV sterilization, CIP cleaning, and GMP/USP/EP compliance. Provides stable 15-18.25MΩ*cm resistivity, low TOC, zero bacteria for injection, biological products, and pharmaceutical production.
High Purity Ion Exchanger for Electronic Workshop Grade Ultrapure Water
High Purity Mixed Bed Ion Exchanger delivers electronic-grade ultrapure water with ≥99.8% desalination rate and 15-18.2 MΩ*cm resistivity. Features ultra-high purity polishing, stable water quality, compact design, and perfect RO system integration for semiconductor, circuit board, and precision electronic manufacturing.
Mixed Bed Polishing Ultrapure Water Equipment 18.25MΩ·cm Resistivity Automatic Regeneration GMP Standard
Post-RO mixed bed polishing ultrapure water equipment delivers 15-18.25MΩ*cm resistivity, removes trace ions/silica/boron, with automatic/manual regeneration, GMP standard, 0.25-200m³/h customizable flow for semiconductor/pharma/battery industries.
Two Stage RO Ultrapure Water Equipment 99.5% Desalination Rate Cosmetic Grade GMP Standard Water Recovery
Two-stage RO Ultrapure Water Equipment for cosmetics manufacturing ensures ≥99.5% desalination rate, 1-5μS/cm conductivity, and GMP-compliant sanitary design. Features PLC automation, 85-90% water recovery, UV sterilization, and custom flow rates from 250L/H to 10T/H for stable production water quality.
Small Flow RO EDI Laboratory Water Purification System 18.25 MΩ·cm Resistivity Chemical Free Deionization
Small flow RO EDI ultrapure water equipment for institute experiments features reverse osmosis + EDI + polishing resin process, producing ≥18.2 MΩ·cm resistivity water. Compact design, chemical-free operation, and customizable flow rates (30T/H) ensure stable experimental water quality for labs and research facilities.
