Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure
Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure
Basic Properties
Place of Origin:
China shannxi xian
Brand Name:
QITONG
Trading Properties
Minimum Order Quantity:
1
Price:
Price on request
Payment Terms:
L/C,T/T,D/P
Product Summary
High Resistivity Stack EDI System produces ultrapure water up to 18.2 MΩ·cm for semiconductor manufacturing. Features chemical-free continuous regeneration, up to 95% water recovery, and stable operation with low maintenance requirements. Ideal for high-standard industrial ultrapure water projects.
Product Custom Attributes
Highlight
Stack Membrane Electrodeionization EDI System
,Semiconductor Grade Ultrapure Equipment
,High Resistivity Water Purification System
Systemdimensions:
Varies By Capacity, Typically Modular Design For Scalability
Operatingtemperaturerange:
Typically 5°C To 45°C
Recoveryrate:
Up To 95% Water Recovery
Technology:
Combination Of Ion Exchange Resins And Ion-selective Membranes With Electrical Current
Pressurerange:
0.1 To 0.6 MPa
Feedwaterquality:
Pre-treated Water With Low Hardness And Organics
Function:
Continuous Removal Of Ionized And Ionizable Species From Water
Maintenancerequirement:
Low Maintenance, Periodic Resin Replacement Recommended
Regeneration:
Chemical-free Continuous Regeneration Using Electrical Current
Puritylevel:
Produces Ultrapure Water With Resistivity Up To 18.2 MΩ·cm
Flowrate:
Varies By Model, Commonly From 1 To 100 M³/h
Operatingvoltage:
Typically 10-30 Volts
Productname:
Electrodeionization (EDI) System
Product Description
Detailed Specifications & Features
High Resistivity Stack EDI System For Semiconductor Ultrapure Water Production
Product Overview
The High Resistivity Stack EDI System is a professional high-end electrodeionization water purification equipment specifically developed for semiconductor manufacturing, electronic precision processing, optoelectronic industries, and high-standard industrial ultrapure water projects. Unlike conventional industrial EDI equipment, this stacked EDI unit focuses on ultra-high resistivity water output and ultra-trace impurity removal, perfectly matching the strict water quality requirements for wafer etching, chip cleaning, circuit board production, and precision electronic processing.
Conventional water treatment equipment cannot effectively remove trace silica, boron, and ultra-low concentration ions, which can easily cause defects in electronic products. By adopting an upgraded stacked membrane stack structure and high-precision electric desalination technology, this system achieves deep and stable purification without chemical regeneration. It can steadily supply 18.2 MΩ·cm high-resistivity ultrapure water for extended periods, making it the core supporting equipment for high-end electronic industrial water treatment systems.
Working Principle
Qualified two-stage RO pretreated water enters the high-density stacked EDI membrane stack uniformly. Under the action of a stable and precise DC electric field, the high-purity internal ion exchange resin rapidly adsorbs residual trace anions, cations, silica, and tiny organic impurities in the water. Through the selective permeation effect of ion exchange membranes, impurity ions migrate directionally and are concentrated into the concentrated water channel for automatic discharge.
The resin completes continuous electric regeneration during operation without acid and alkali chemical dosing, avoiding chemical residue and secondary water pollution. Equipped with industrial high-precision online resistivity monitoring and PLC intelligent linkage systems, the equipment automatically adjusts operating voltage, current, and water flow according to inlet water changes. This maintains zero fluctuation of outlet water quality and enables 24-hour continuous and stable supply of semiconductor-grade ultrapure water.
Core Advantages
- Ultra-High Resistivity Stable Output: Upgraded high-density stacked membrane stack effectively removes ultra-trace ions, silica, and TOC, stably maintaining 15-18.2 MΩ·cm high resistivity water quality, fully compliant with semiconductor industrial standards.
- Stacked High-Efficiency Structure: Compact layered stacked design features large water yield per unit area, high desalination efficiency, and small footprint, convenient for integrated installation and system matching in electronic workshops.
- 100% Chemical-Free Operation: Automatic electric resin regeneration throughout the entire process, no acid and alkali consumption, no chemical waste discharge, zero pollution, meeting clean production requirements of high-tech factories.
- Ultra-Low Impurity Removal Capacity: Effectively removes trace boron, silica, and micro-particles that cannot be completely filtered by ordinary EDI equipment, ensuring high cleanliness of process water for precision electronics production.
- Intelligent Constant Water Quality Control: Real-time online monitoring of water resistivity and automatic parameter calibration, no water quality attenuation after long-term full-load operation, ensuring consistent production water standards.
- Industrial Durable & Low Maintenance: High-strength anti-aging membrane stack and industrial anti-corrosion structure, low failure rate, long service life, significantly reducing long-term operation and maintenance costs.
Technical Parameters
| Applicable Scenarios | Semiconductor wafer production, chip manufacturing, PCB production, optoelectronic panel industry, precision electronic processing, high-end industrial ultrapure water projects |
| Customizable Water Flow | 0.5-50 m³/h |
| Supporting Pretreatment | Two-stage RO reverse osmosis system |
| Outlet Water Resistivity | 15-18.2 MΩ·cm (stable continuous output) |
| Ultimate Desalination Rate | ≥99.8% |
| TOC Removal Rate | High-efficiency removal of trace organic carbon |
| Operation Mode | 24-hour full-automatic unattended continuous operation |
| Core Structure | High-density stacked EDI membrane stack |
| Control System | PLC intelligent linkage + online water quality real-time monitoring |
Application Scenarios
- Semiconductor wafer and chip manufacturing ultrapure water supply
- Precision etching, cleaning and coating process water for electronic components
- LCD, OLED photoelectric panel and solar cell production water treatment
- PCB circuit board industrial high-purity water preparation
- High-tech industrial park standardized ultrapure water system construction and upgrading
Packaging & After-sales Service
Export-standard fumigated wooden case packaging with complete installation drawings, wiring diagrams, and professional operation manuals. Core stacked EDI membrane stacks, precision sensors, and intelligent control systems enjoy 1-year warranty. We provide personalized customized flow and system matching solutions according to different electronic production line standards, supporting long-term remote technical support and global after-sales service.
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