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chemical free edi system
19 Items Found
Mini Compact Electrodeionization EDI System for Chemical Free Laboratory Operation
Mini EDI electrodeionization system for lab ultrapure water units. Chemical-free continuous operation produces stable 15-18.2 MΩ·cm water. Compact design, low maintenance, high recovery rate up to 95%. Ideal for pharmaceutical, semiconductor and laboratory applications.
18.25 MΩ·cm EDI Ultrapure Water System Semiconductor Chip Cleaning Chemical Free Continuous Operation
Industrial EDI ultrapure water system produces 18.25MΩ·cm resistivity water for semiconductor chip cleaning. Features chemical-free EDI technology, two-stage RO with 99% desalination, PLC automation, and customizable capacity up to 5000L/H. Compliant with SEMI standards, includes UV sterilization and 1-year warranty.
High Flow Industrial Deionized Water System for Chemical Free Operation
High Flow EDI System for new energy battery factories offers large-capacity industrial deionization with 98% desalt rate, non-chemical operation, and stable high-purity water output. Features upgraded membrane stack, two-stage RO pretreatment, PLC intelligent control, and supports 5-100m³/h customizable flow for continuous 24-hour operation.
18.2 Megohm EDI Water Treatment System with Chemical Free Regeneration
High Resistivity Stack EDI System produces ultrapure water up to 18.2 MΩ·cm for semiconductor manufacturing. Features chemical-free continuous regeneration, compact stacked design, fully automatic operation, and low maintenance. Offers stable water quality with up to 95% recovery rate.
Custom Industrial RO EDI Ultrapure Water System High Purity Output Chemical Free Operation
Custom industrial RO+EDI ultrapure water treatment equipment combines double-stage RO filtration and EDI electrodeionization to produce high-purity deionized water (15-18.25MΩ*cm). Features chemical-free operation, PLC intelligent control, fully customizable capacity (250L/H-5000L/H), skid-mounted structure, and stable performance for industrial production.
RO Post Polishing Electrodeionization EDI System with Chemical Free Continuous Operation
RO Post Polishing EDI System replaces traditional mixed beds with chemical-free continuous operation, stable high-purity water output, and full unattended automation. Features ISO 9001 & CE certifications, compact integrated structure, and supports 0.5-50m³/h customizable flow for industrial water system upgrades.
Small Flow RO EDI Laboratory Water Purification System 18.25 MΩ·cm Resistivity Chemical Free Deionization
Small flow RO EDI ultrapure water equipment for institute experiments features reverse osmosis + EDI + polishing resin process, producing ≥18.2 MΩ·cm resistivity water. Compact design, chemical-free operation, and customizable flow rates (30T/H) ensure stable experimental water quality for labs and research facilities.
Industrial High Purity Electrodeionization EDI System with 18.2 Megohm Resistivity
Industrial High-Purity EDI System produces ultrapure water (18.2 MΩ·cm) with chemical-free continuous regeneration. Features high recovery (up to 95%), low maintenance, and automated control. Ideal for pharmaceutical, power plants, and electronics industries with eco-friendly operation.
Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure
High Resistivity Stack EDI System produces ultrapure water up to 18.2 MΩ·cm for semiconductor manufacturing. Features chemical-free continuous regeneration, up to 95% water recovery, and stable operation with low maintenance requirements. Ideal for high-standard industrial ultrapure water projects.
