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mixed bed deionizer
15 Items Found
Custom Industrial RO EDI Ultrapure Water System High Purity Output Chemical Free Operation
Custom industrial RO+EDI ultrapure water treatment equipment combines double-stage RO filtration and EDI electrodeionization to produce high-purity deionized water (15-18.25MΩ*cm). Features chemical-free operation, PLC intelligent control, fully customizable capacity (250L/H-5000L/H), skid-mounted structure, and stable performance for industrial production.
RO Post Polishing Electrodeionization EDI System with Chemical Free Continuous Operation
RO Post Polishing EDI System replaces traditional mixed beds with chemical-free continuous operation, stable high-purity water output, and full unattended automation. Features ISO 9001 & CE certifications, compact integrated structure, and supports 0.5-50m³/h customizable flow for industrial water system upgrades.
Industrial Large Flow High Purity Water System 18.25MΩ·Cm For Electronic Chip Cleaning
Industrial large-flow ultrapure water system for semiconductor fabs and electronic chip manufacturing. Features two-stage RO + EDI + polishing mixed bed process, producing 18.25MΩ*cm ultrapure water with TOC ≤1ppb. Customizable flow 10-100m³/h, PLC automated control, 24h continuous operation. Complies with SEMI/ASTM standards for wafer cleaning, etching, and chip production.
EDI Integrated Deep Water Desalination Equipment High Purity Ultrapure Output Eco Friendly Operation
EDI Integrated Deep Water Desalination Equipment produces 15-18.25MΩ*cm ultra-pure water for electronic manufacturing via two-stage RO + EDI. Features 45% recovery, 99.5% salt rejection, PLC automation, chemical-free operation, compact skid design, and 2-year warranty. Ideal for semiconductors, PCBs, and precision electronics.
Mini Compact Electrodeionization EDI System for Chemical Free Laboratory Operation
Mini EDI electrodeionization system for lab ultrapure water units. Chemical-free continuous operation produces stable 15-18.2 MΩ·cm water. Compact design, low maintenance, high recovery rate up to 95%. Ideal for pharmaceutical, semiconductor and laboratory applications.
18.25 MΩ·cm EDI Ultrapure Water System Semiconductor Chip Cleaning Chemical Free Continuous Operation
Industrial EDI ultrapure water system produces 18.25MΩ·cm resistivity water for semiconductor chip cleaning. Features chemical-free EDI technology, two-stage RO with 99% desalination, PLC automation, and customizable capacity up to 5000L/H. Compliant with SEMI standards, includes UV sterilization and 1-year warranty.
