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ultrapure water purification system
20 Items Found
Electroplating Anti Corrosion Ultrapure Water Equipment Double Stage RO EDI Deionization Custom Capacity 0.5-50m3/h
Full anti-corrosion industrial ultrapure water equipment for electroplating workshops. Features double stage RO + EDI deionization, removes chloride/heavy metal ions, 0.5-50m³/h capacity. Anti-rust design adapts to corrosive environments, 24H automatic operation with PLC control for stable low conductivity water output.
Photovoltaic Module Water Purification System 18.2 MΩ·cm Two Stage RO EDI Process PLC Control
Photovoltaic ultrapure water equipment with 18.2MΩ·cm purity, double-stage RO + EDI + mixed bed polishing process. Features PLC touch screen control, ≥99% desalination rate, 80m³/h flow rate, and specialized control of silicon/boron/TOC for solar cell wafer etching, texturing, and cleaning processes.
Stack Membrane Electrodeionization EDI System for Semiconductor Grade Ultrapure
High Resistivity Stack EDI System produces ultrapure water up to 18.2 MΩ·cm for semiconductor manufacturing. Features chemical-free continuous regeneration, up to 95% water recovery, and stable operation with low maintenance requirements. Ideal for high-standard industrial ultrapure water projects.
Skid Mounted Compact Ultra Pure Water Purifier 15-18.25MΩ·cm Resistivity EDI Continuous Deionization New Energy Battery
Skid-mounted compact ultrapure water equipment for new energy battery production. Features pretreatment + two-stage RO + EDI process, producing 15-18.25MΩ*cm electronic-grade water. Compact plug-and-play design, chemical-free EDI operation, PLC automatic control, and modular expansion capability.
316L Stainless Steel Pharmaceutical Grade Vessel for Sanitary Ultrapure Water
316L stainless steel mixed bed vessel for pharmaceutical ultra-pure water. Sanitary grade with corrosion resistance, smooth inner wall, and no dead corners. Removes trace salts and impurities via mixed resin, achieving 15-18.2 MΩ*cm resistivity. Customizable flow 0.5-30m³/h, 1-year warranty, export packaging.
Small Flow RO EDI Laboratory Water Purification System 18.25 MΩ·cm Resistivity Chemical Free Deionization
Small flow RO EDI ultrapure water equipment for institute experiments features reverse osmosis + EDI + polishing resin process, producing ≥18.2 MΩ·cm resistivity water. Compact design, chemical-free operation, and customizable flow rates (30T/H) ensure stable experimental water quality for labs and research facilities.
Industrial Large Flow High Purity Water System 18.25MΩ·Cm For Electronic Chip Cleaning
Industrial large-flow ultrapure water system for semiconductor fabs and electronic chip manufacturing. Features two-stage RO + EDI + polishing mixed bed process, producing 18.25MΩ*cm ultrapure water with TOC ≤1ppb. Customizable flow 10-100m³/h, PLC automated control, 24h continuous operation. Complies with SEMI/ASTM standards for wafer cleaning, etching, and chip production.
18.2 Megohm EDI Water Treatment System with Chemical Free Regeneration
High Resistivity Stack EDI System produces ultrapure water up to 18.2 MΩ·cm for semiconductor manufacturing. Features chemical-free continuous regeneration, compact stacked design, fully automatic operation, and low maintenance. Offers stable water quality with up to 95% recovery rate.
Food Grade SUS304 Panel Type Water Tank with Modular Assembly Design
304 stainless steel square water storage tank with food-grade SUS304 material, modular assembly for flexible customization (1-2000m³), zero leakage design, 30+ year service life. Compatible with RO/EDI systems, hotels, factories, and rural drinking water projects. ISO9001 certified with 2-year warranty.
