18.2 Megohm EDI Water Treatment System with Chemical Free Regeneration
18.2 Megohm EDI Water Treatment System
,Chemical Free Regeneration System
,High Resistivity Stack Module
This High Resistivity Stack EDI System is advanced water purification equipment specifically engineered for semiconductor manufacturing, chip production, photoelectric panels, and high-precision electronic industrial ultrapure water preparation. Semiconductor production requires ultra-high-purity process water with extremely low ion content, TOC, and residual impurities that conventional single-stage water treatment cannot achieve.
Utilizing stacked EDI membrane stack technology combined with electric desalination and ion exchange purification principles, this system enables deep, continuous removal of trace ions in water. It consistently produces high-resistivity ultrapure water, completely replacing traditional chemical regeneration ion exchange equipment. The system features zero chemical pollution, fully automatic operation, and stable water quality output, making it essential core equipment for semiconductor industrial ultrapure water treatment projects.
Pre-treated RO pure water enters the high-precision stacked EDI membrane stack. Under a stable DC electric field, residual anions and cations in the water directionally migrate through selective ion exchange membranes, ultimately being concentrated and discharged in the concentrated water chamber.
Internal ion exchange resin efficiently adsorbs trace impurities while achieving continuous automatic electric regeneration through water electrolysis, eliminating the need for acid and alkali chemical regeneration. The system continuously removes trace salts, heavy metal ions, and organic substances, steadily improving and maintaining high water resistivity.
With intelligent electric control and water quality monitoring linkage, the equipment maintains long-term stable deep desalination effects and meets continuous ultrapure water supply demands for semiconductor production.
| Applicable Scenarios | Semiconductor chip manufacturing, electronic precision processing, photoelectric panel industry, high-end laboratory ultrapure water projects |
| Treatment Flow | 0.5-50m³/h (customizable for industrial production line) |
| Outlet Water Resistivity | Stable at 15-18.2 MΩ*cm |
| Desalination Rate | ≥99.5% |
| Core Technology | Stacked EDI electric desalination + continuous resin electric regeneration |
| Inlet Water Requirement | RO reverse osmosis purified water |
| Operation Mode | 24-hour fully automatic continuous intelligent operation |
| Control Index | Water resistivity, TOC, ion concentration, operating voltage and current |
- Semiconductor and wafer manufacturing ultrapure water supply
- Chip etching, cleaning and precision process water treatment
- LCD panel, photoelectric and solar energy industry pure water projects
- High-precision electronic component production water purification
- Scientific research laboratories and high-end industrial ultrapure water preparation
Export standard fumigated wooden case packaging, equipped with complete installation drawings, wiring diagrams, and professional operation manuals. Core EDI membrane stacks, electric control systems, and monitoring sensors enjoy 1-year warranty.
We provide customized flow and high-resistivity water quality configuration solutions according to production line demands, offering long-term remote technical support and after-sales service for global semiconductor industrial water treatment projects.
