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ro water treatment system
68 Items Found
Stainless Steel 304 316 RO Desalination System PLC Control Salt Rejection for Industrial Water Treatment
Single-stage RO desalination equipment for factory circulating water treatment. Features stainless steel construction, PLC automation, 45-55% recovery rate, and ≥99% salt rejection. Compact skid-mounted design saves space and reduces water consumption.
Photovoltaic Module Water Purification System 18.2 MΩ·cm Two Stage RO EDI Process PLC Control
Photovoltaic ultrapure water equipment with 18.2MΩ·cm purity, double-stage RO + EDI + mixed bed polishing process. Features PLC touch screen control, ≥99% desalination rate, 80m³/h flow rate, and specialized control of silicon/boron/TOC for solar cell wafer etching, texturing, and cleaning processes.
Pharmaceutical Sterile Ultrapure Water Equipment UV Sterilizing Device Low TOC Control GMP Compliance
Pharmaceutical sterile ultrapure water equipment with UV sterilizing device. Features 316L sterile tank, RO+EDI purification, UV sterilization, CIP cleaning, and GMP/USP/EP compliance. Provides stable 15-18.25MΩ*cm resistivity, low TOC, zero bacteria for injection, biological products, and pharmaceutical production.
Automatic Regeneration Mixed Bed for Boiler Feed Water Deep Purification
Automatic Regeneration Mixed Bed for boiler feed water deep purification. Features automatic cycle regeneration, deep removal of hardness and residual salts, stable water output, and industrial anti-corrosion structure. Ideal for industrial boiler rooms and thermal power plants.
Custom Industrial RO EDI Ultrapure Water System High Purity Output Chemical Free Operation
Custom industrial RO+EDI ultrapure water treatment equipment combines double-stage RO filtration and EDI electrodeionization to produce high-purity deionized water (15-18.25MΩ*cm). Features chemical-free operation, PLC intelligent control, fully customizable capacity (250L/H-5000L/H), skid-mounted structure, and stable performance for industrial production.
18.25 MΩ·cm EDI Ultrapure Water System Semiconductor Chip Cleaning Chemical Free Continuous Operation
Industrial EDI ultrapure water system produces 18.25MΩ·cm resistivity water for semiconductor chip cleaning. Features chemical-free EDI technology, two-stage RO with 99% desalination, PLC automation, and customizable capacity up to 5000L/H. Compliant with SEMI standards, includes UV sterilization and 1-year warranty.
High Purity Ion Exchanger for Electronic Workshop Grade Ultrapure Water
High Purity Mixed Bed Ion Exchanger delivers electronic-grade ultrapure water with ≥99.8% desalination rate and 15-18.2 MΩ*cm resistivity. Features ultra-high purity polishing, stable water quality, compact design, and perfect RO system integration for semiconductor, circuit board, and precision electronic manufacturing.
Industrial Large Flow High Purity Water System 18.25MΩ·Cm For Electronic Chip Cleaning
Industrial large-flow ultrapure water system for semiconductor fabs and electronic chip manufacturing. Features two-stage RO + EDI + polishing mixed bed process, producing 18.25MΩ*cm ultrapure water with TOC ≤1ppb. Customizable flow 10-100m³/h, PLC automated control, 24h continuous operation. Complies with SEMI/ASTM standards for wafer cleaning, etching, and chip production.
RO Post Polishing Electrodeionization EDI System with Chemical Free Continuous Operation
RO Post Polishing EDI System replaces traditional mixed beds with chemical-free continuous operation, stable high-purity water output, and full unattended automation. Features ISO 9001 & CE certifications, compact integrated structure, and supports 0.5-50m³/h customizable flow for industrial water system upgrades.
