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ultrapure water machine
11 Items Found
High Purity Ion Exchanger for Electronic Workshop Grade Ultrapure Water
High Purity Mixed Bed Ion Exchanger delivers electronic-grade ultrapure water with ≥99.8% desalination rate and 15-18.2 MΩ*cm resistivity. Features ultra-high purity polishing, stable water quality, compact design, and perfect RO system integration for semiconductor, circuit board, and precision electronic manufacturing.
18.25 MΩ·cm EDI Ultrapure Water System Semiconductor Chip Cleaning Chemical Free Continuous Operation
Industrial EDI ultrapure water system produces 18.25MΩ·cm resistivity water for semiconductor chip cleaning. Features chemical-free EDI technology, two-stage RO with 99% desalination, PLC automation, and customizable capacity up to 5000L/H. Compliant with SEMI standards, includes UV sterilization and 1-year warranty.
Two Stage RO Ultrapure Water Equipment 99.5% Desalination Rate Cosmetic Grade GMP Standard Water Recovery
Two-stage RO Ultrapure Water Equipment for cosmetics manufacturing ensures ≥99.5% desalination rate, 1-5μS/cm conductivity, and GMP-compliant sanitary design. Features PLC automation, 85-90% water recovery, UV sterilization, and custom flow rates from 250L/H to 10T/H for stable production water quality.
Custom Industrial RO EDI Ultrapure Water System High Purity Output Chemical Free Operation
Custom industrial RO+EDI ultrapure water treatment equipment combines double-stage RO filtration and EDI electrodeionization to produce high-purity deionized water (15-18.25MΩ*cm). Features chemical-free operation, PLC intelligent control, fully customizable capacity (250L/H-5000L/H), skid-mounted structure, and stable performance for industrial production.
Skid Mounted Compact Ultra Pure Water Purifier 15-18.25MΩ·cm Resistivity EDI Continuous Deionization New Energy Battery
Skid-mounted compact ultrapure water equipment for new energy battery production. Features pretreatment + two-stage RO + EDI process, producing 15-18.25MΩ*cm electronic-grade water. Compact plug-and-play design, chemical-free EDI operation, PLC automatic control, and modular expansion capability.
316L Stainless Steel Pharmaceutical Grade Vessel for Sanitary Ultrapure Water
316L stainless steel mixed bed vessel for pharmaceutical ultra-pure water. Sanitary grade with corrosion resistance, smooth inner wall, and no dead corners. Removes trace salts and impurities via mixed resin, achieving 15-18.2 MΩ*cm resistivity. Customizable flow 0.5-30m³/h, 1-year warranty, export packaging.
Mini Compact Electrodeionization EDI System for Chemical Free Laboratory Operation
Mini EDI electrodeionization system for lab ultrapure water units. Chemical-free continuous operation produces stable 15-18.2 MΩ·cm water. Compact design, low maintenance, high recovery rate up to 95%. Ideal for pharmaceutical, semiconductor and laboratory applications.
316L Aseptic Stainless Steel Water Tank for Ultrapure Sanitary Storage
316L aseptic stainless steel water tank for ultrapure water storage, featuring SUS316L material with mirror polishing (Ra≤0.8μm), seamless welding, and sterile design. Supports online CIP cleaning, custom capacities (0.5-100m³), and meets GMP/USP standards for semiconductor, pharmaceutical, and new energy applications.
Industrial Large Flow High Purity Water System 18.25MΩ·Cm For Electronic Chip Cleaning
Industrial large-flow ultrapure water system for semiconductor fabs and electronic chip manufacturing. Features two-stage RO + EDI + polishing mixed bed process, producing 18.25MΩ*cm ultrapure water with TOC ≤1ppb. Customizable flow 10-100m³/h, PLC automated control, 24h continuous operation. Complies with SEMI/ASTM standards for wafer cleaning, etching, and chip production.
